Trion Mini-lock PECVD System (Plasma Enhanced Chemical Vapor Deposition)

Full Description

PECVD System (Plasma Enhanced Chemical Vapor Deposition) This PECVD System was used by University of Arkansas departments. The condition and functionality of this equipment is unknown. All items are as is, whereas with NO guarantee. As required by Arkansas law, for a period of twenty (20) days from the auction start date this item is offered exclusively to eligible Arkansas governmental entities. If no intergovernmental transfer is completed during this twenty (20) day period, then this item will open to public bidding on Day 21. A Plasma-Enhanced Chemical Vapor Deposition (PECVD) system is a specialized laboratory and industrial equipment used to deposit high-quality thin films onto a substrate at lower temperatures compared to traditional chemical vapor deposition. By using radio frequency (RF) plasma to energize and break down precursor gases, PECVD systems typically operate between 200°C and 400°C rather than the 600°C to 1200°C required by thermal CVD. This makes it essential for coating temperature-sensitive substrates like plastics, polymers, and fully fabricated semiconductor wafers with pre-existing metal layers. SHIPPING is not offered. SELLER WILL NOT PACK, LOAD, HAUL, OR DELIVER. BUYER IS RESPONSIBLE FOR REMOVAL OF ITEMS INCLUDING ALL PACKING, LOADING, HAULING, AND SHIPPING. NO SHIPPING OFFERED. Inspection is by appointment only: Monday – Friday, 9:00am – 3:00pm Contacts: Chris Fornoff cfornoff@uark.edu or Tegan Flaherty tflaherty@uark.edu Location: The University of Arkansas Surplus Warehouse, 300 Eastern Ave., Fayetteville, AR 72701 ***Awarded bidder MUST schedule the pick-up date and time with one of the above departmental contacts***